Plasma Etch, Chemical Vapor Deposition (CVD) and Plasma-Enhanced Chemical Vapor Deposition (PECVD) applications require a thorough understanding of the complex chemistries involved in the processes. Also critical to the processes is the ability to monitor low-level components.
For plasma applications, scientists choose Extrel MAX and MAX-LT™ Flange Mounted Mass Spectrometers. These detection systems offer high performance and speed with the capability to perform energy analysis.
High sensitivity and high abundance sensitivity enables monitoring of very low partial pressure components within a high background. Ions, radicals, and neutrals can be measured as well. Extrel’s Plasma Analysis System can work with processes up to atmospheric pressure.
