Mass spectrometry has long been a key technique in the development and production of semiconductors.
The Semiconductor market requires:
- Use of high purity materials
- Tight control of the process
- Use of an analysis and control system with high sensitivity and resolution to adapt to chemistry changes
- High stability and repeatability of analytical techniques
Ideal for gas purity, the Extrel VeraSpec APIMS combines Atmospheric Pressure Ionization (API) technology with a high performance mass spectrometer optimized over five decades in industrial gas analysis. It provides ease-of-use to continuously monitor Nitrogen, Argon, Helium, Oxygen, and Hydrogen supply streams and rapidly report ppt-level contamination to protect.
Gas Purity
Ultra-pure gases are a necessity for semiconductor device fabrication and the continuous monitoring of bulk gas purity can ensure maximum production.
Lithography
As Vacuum Ultra Violet (VUV) Lithography becomes a process application, the need to develop the next generation of vacuum compatible photoresists is critical. The development of these new photoresists depends on understanding their properties under vacuum.
MBE Monitoring
Analysis of Molecular Beam Epitaxy (MBE) requires the use of a Mass Spectrometer with very high sensitivity and low noise electronics to monitor not only the low flux rate of multiple molecular beams but also to perform Ultra High Vacuum (UHV) Residual Gas Analysis of the chamber.
Plasma and CVD Process Monitoring
Plasma Etch, Chemical Vapor Deposition (CVD) and Plasma-Enhanced Chemical Vapor Deposition (PECVD) applications require a thorough understanding of the complex chemistries involved in the processes and the ability to monitor low-level components.
Scrubber & Burn Box Efficiency
For Semiconductor producers, the monitoring of the Destruction and Removal Efficiency (DRE) of Hazardous Air Pollutants (HAPs) and Greenhouse Gases has become increasingly important.
Extrel CMS, LLC
575 Epsilon Drive
Pittsburgh, PA 15238
USA
