Mass spectrometry has long been a key technique in the development and production of semiconductors.
The Semiconductor market requires:
Ideal for gas purity, the Extrel VeraSpec APIMS combines Atmospheric Pressure Ionization (API) technology with a high performance mass spectrometer optimized over five decades in industrial gas analysis. It provides ease-of-use to continuously monitor Nitrogen, Argon, Helium, Oxygen, and Hydrogen supply streams and rapidly report ppt-level contamination to protect.
Ultra-pure gases are a necessity for semiconductor device fabrication and the continuous monitoring of bulk gas purity can ensure maximum production.
As Vacuum Ultra Violet (VUV) Lithography becomes a process application, the need to develop the next generation of vacuum compatible photoresists is critical. The development of these new photoresists depends on understanding their properties under vacuum.
Analysis of Molecular Beam Epitaxy (MBE) requires the use of a Mass Spectrometer with very high sensitivity and low noise electronics to monitor not only the low flux rate of multiple molecular beams but also to perform Ultra High Vacuum (UHV) Residual Gas Analysis of the chamber.
Plasma Etch, Chemical Vapor Deposition (CVD) and Plasma-Enhanced Chemical Vapor Deposition (PECVD) applications require a thorough understanding of the complex chemistries involved in the processes and the ability to monitor low-level components.
For Semiconductor producers, the monitoring of the Destruction and Removal Efficiency (DRE) of Hazardous Air Pollutants (HAPs) and Greenhouse Gases has become increasingly important.