Semiconductor

As Vacuum Ultra Violet (VUV) Lithography becomes a process application, the need to develop the next generation of vacuum compatible photoresists is critical. The development of these new photoresists depends on understanding their properties under vacuum. Our Flange Mounted Mass Spectrometers offer the high sensitivity and resolution needed to fully characterize the material outgassing and what is produced during the breakdown of the photoresists.

Analysis of Molecular Beam Epitaxy (MBE) requires the use of a Mass Spectrometer with very high sensitivity and low noise electronics to monitor not only the low flux rate of multiple molecular beams but also to perform Ultra High Vacuum (UHV) Residual Gas Analysis of the chamber.

Plasma Etch, Chemical Vapor Deposition (CVD) and Plasma-Enhanced Chemical Vapor Deposition (PECVD) applications require a thorough understanding of the complex chemistries involved in the processes. Also critical to the processes is the ability to monitor low-level components.

For Semiconductor producers, the monitoring of the Destruction and Removal Efficiency (DRE) of Hazardous Air Pollutants (HAPs) and Greenhouse Gases has become increasingly important as laws (driven by public awareness and global agreements such as the Kyoto Protocol) and local pollution regulations have been significantly tightened. These strict standards often include …