Secondary Ion Mass Spectrometry (SIMS) is used to detect and characterize trace elements at or near the surface of a solid or thin film allowing researchers to understand the chemical composition of the surface. This surface science technique requires the use of systems with very high sensitivity and the ability to perform high resolution energy analysis. SIMS is useful for a wide variety of surface analysis. For example, SIMS can be used to detect and analyze contaminants on a surface, analyze materials and devices to ensure the quality of specific products, and study atomic scale defects that may occur in the manufacturing of semiconductor chips or other materials.