As Vacuum Ultra Violet (VUV) Lithography becomes a process application, the need to develop the next generation of vacuum compatible photoresists is critical. The development of these new photoresists depends on understanding their properties under vacuum. Our Flange Mounted Mass Spectrometers, the MAX and MAX-LT systems, offer the high sensitivity and resolution needed to fully characterize the material outgassing and what is produced during the breakdown of the photoresists.
Extrels Lithography products include:
Benefits of using Extrels systems in the Lithography process: